• DocumentCode
    3132095
  • Title

    Interfacial reactions of Sn-0.7Cu, Sn-58Bi and Sn-9Zn lead-free solders with the Au/Ni/SUS 304 substrate

  • Author

    Chen, Hao ; Hao Chen ; Yen, Yee-wen

  • Author_Institution
    Grad. Inst. of Mater. Sci. & Technol., Nat. Taiwan Univ. of Sci. & Technol., Taipei, Taiwan
  • fYear
    2009
  • fDate
    21-23 Oct. 2009
  • Firstpage
    606
  • Lastpage
    608
  • Abstract
    This study investigates the interfacial reactions between three kinds of lead-free solders, Sn-0.7 wt%Cu (SC), Sn-58 wt%Bi (SB) and Sn-9 wt%Zn (SZ), and Au/Ni/SUS 304 substrates. The reaction temperatures were at 240, 255 and 270°C, and the reactions times were varied between 1 to 5 hours. According to experimental results, only the (Cu,Ni)6Sn5 phase was found in the SC/Au/Ni/SUS 304 couples. When the Ni layer was completely consumed, the massive spalling of the (Cu,Ni)6Sn5 phase was found in the solder. And then the FeSn2 phase was formed at the SUS 304 surface. Only the Ni3Sn4 phase was found at the SB/Au/Ni/SUS 304 interface. In the SZ/Au/Ni/SUS 304 couple, the Ni5Zn21 phase was formed at the interface. The thickness of the IMC in the SB/Au/Ni/SUS 304 and SZ/Au /Ni/SUS 304 couples increased with increasing the reaction time.
  • Keywords
    bismuth alloys; copper alloys; iron alloys; solders; substrates; tin alloys; zinc alloys; (CuNi)6Sn5; Au/Ni/SUS 304 substrate; FeSn2; IMC thickness; Ni3Sn4; SnBi; SnCu; SnZn; interfacial reactions; lead-free solders; massive spalling; temperature 240 degC; temperature 255 degC; temperature 270 degC; Environmentally friendly manufacturing techniques; Gold; Lead; Materials science and technology; Optical microscopy; Scanning electron microscopy; Solids; Steel; Temperature; Thermal resistance; Au/Ni/SUS 304 substrate; Sn-0.7 wt%Cu (SC); Sn-58 wt%Bi (SB) and Sn-9 wt%Zn(SZ); interfacial reaction;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microsystems, Packaging, Assembly and Circuits Technology Conference, 2009. IMPACT 2009. 4th International
  • Conference_Location
    Taipei
  • Print_ISBN
    978-1-4244-4341-3
  • Electronic_ISBN
    978-1-4244-4342-0
  • Type

    conf

  • DOI
    10.1109/IMPACT.2009.5382258
  • Filename
    5382258