Cost effective inspection methodology of AIT-II with ADC 2.0

Author

Terryll, Kathleen ; Mateos, Carlos ; Lutz, Andreas

Author_Institution

Agere Syst., Madrid, Spain

fYear

2001

fDate

2001

Firstpage

179

Lastpage

185

Abstract

The AIT-II, a dark-field tool with automatic defect classification (ADC), is one of the most powerful in-line inspection combinations for reducing defect excursions and working on baseline yield issues. This report highlights the yield enhancement and cost benefits of AIT-II with Impact ADC 2.0 at Agere Systems, Madrid, Spain. The current, streamlined, inspection methodology is presented and contrasted with the traditional method. Defects found by the ADC classifiers are presented with real examples of the baseline events, both yield limiting and nonyield limiting. More importantly, we demonstrate how these tools can help people focus on the real yield limiting issues. Finally, we propose how to calculate cost of ownership by taking into account the yield “saved” by using AIT-II with Impact ADC 2.0

Keywords

cost-benefit analysis; fault location; inspection; integrated circuit testing; integrated circuit yield; pattern classification; production testing; ADC classifiers; AIT-II; AIT-II dark-field tool; Impact ADC 2.0; automatic defect classification; baseline yield; cost benefits; cost effective inspection methodology; cost of ownership; defect excursions; in-line inspection; inspection methodology; nonyield limiting events; saved yield costs; yield enhancement; yield limiting events; yield limiting issues; Accuracy; Application specific integrated circuits; Costs; Data analysis; Data engineering; Dielectrics; Inspection; Production systems; Sampling methods; Throughput;

fLanguage

English

Publisher

ieee

Conference_Titel

Advanced Semiconductor Manufacturing Conference, 2001 IEEE/SEMI

Conference_Location

Munich

ISSN

1078-8743

Print_ISBN

0-7803-6555-0

Type

conf

DOI

10.1109/ASMC.2001.925644

Filename

925644