Title :
Direct electrostatic levitation and propulsion of silicon wafer
Author :
Jin, Ju ; Jeon, Jong Up ; Higuchi, Toshiro
Author_Institution :
Kanagawa Acad. of Sci. & Technol., Japan
Abstract :
A new type of contact-less wafer manipulator, featuring “direct electrostatic levitation and propulsion of silicon wafer” (DELP-SW), has been successfully developed. The novel aspect of this manipulator is that a silicon wafer can be directly levitated and driven via electrostatic forces. In this paper, a brief review of basic principles is presented. This is followed by a description of the structure of a prototype DELP-SW mechanism, including electrode design, position feedback control method, driving principle and the operational procedure. Experimental results which demonstrate completely contact-less transportation of an 8-inch silicon wafer are also presented
Keywords :
electric propulsion; electrodes; electronic equipment manufacture; electrostatic devices; electrostatics; feedback; materials handling; position control; semiconductor technology; 8 in; contact-less wafer manipulator; direct electrostatic levitation; direct electrostatic propulsion; driving principle; electrode design; electrostatic forces; operational procedure; position feedback control method; silicon wafer; Electrodes; Electrostatic levitation; Glass; Magnetic levitation; Propulsion; Semiconductor materials; Silicon; Surface contamination; Surface discharges; Transportation;
Conference_Titel :
Industry Applications Conference, 1996. Thirty-First IAS Annual Meeting, IAS '96., Conference Record of the 1996 IEEE
Conference_Location :
San Diego, CA
Print_ISBN :
0-7803-3544-9
DOI :
10.1109/IAS.1996.563848