• DocumentCode
    3133091
  • Title

    Electroplating equipment design considerations for copper microvia filling

  • Author

    Lefebvre, Mark ; Najjar, Elie ; Gomez, Luis ; Barstad, Leon ; Chen, Bruce ; Bayes, Martin

  • Author_Institution
    Dow Electron. Mater., Dow Chem. Co., Marlborough, MA, USA
  • fYear
    2009
  • fDate
    21-23 Oct. 2009
  • Firstpage
    77
  • Lastpage
    80
  • Abstract
    Electrolytic copper microvia filling is an enabling technology, prominently used in today´s manufacture of advanced HDI and packaging substrate product. In the high volume mass production of copper filled microvias, a wide variety of electroplating equipment designs are available to the fabricator. In this article, various aspects of electroplating equipment design used in the mass production of copper filled microvias are discussed, including a comparison of continuous and batch systems, anode materials, solution delivery (convection), and copper replenishment. The impacts of these variables on microvia filling performance, plated through hole throwing power, surface distribution, trace profile and bath life are described.
  • Keywords
    electronics packaging; electroplating; HDI; copper microvia filling; electroplating equipment design; packaging substrate product; Copper; Filling;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microsystems, Packaging, Assembly and Circuits Technology Conference, 2009. IMPACT 2009. 4th International
  • Conference_Location
    Taipei
  • Print_ISBN
    978-1-4244-4341-3
  • Electronic_ISBN
    978-1-4244-4342-0
  • Type

    conf

  • DOI
    10.1109/IMPACT.2009.5382313
  • Filename
    5382313