DocumentCode
3133091
Title
Electroplating equipment design considerations for copper microvia filling
Author
Lefebvre, Mark ; Najjar, Elie ; Gomez, Luis ; Barstad, Leon ; Chen, Bruce ; Bayes, Martin
Author_Institution
Dow Electron. Mater., Dow Chem. Co., Marlborough, MA, USA
fYear
2009
fDate
21-23 Oct. 2009
Firstpage
77
Lastpage
80
Abstract
Electrolytic copper microvia filling is an enabling technology, prominently used in today´s manufacture of advanced HDI and packaging substrate product. In the high volume mass production of copper filled microvias, a wide variety of electroplating equipment designs are available to the fabricator. In this article, various aspects of electroplating equipment design used in the mass production of copper filled microvias are discussed, including a comparison of continuous and batch systems, anode materials, solution delivery (convection), and copper replenishment. The impacts of these variables on microvia filling performance, plated through hole throwing power, surface distribution, trace profile and bath life are described.
Keywords
electronics packaging; electroplating; HDI; copper microvia filling; electroplating equipment design; packaging substrate product; Copper; Filling;
fLanguage
English
Publisher
ieee
Conference_Titel
Microsystems, Packaging, Assembly and Circuits Technology Conference, 2009. IMPACT 2009. 4th International
Conference_Location
Taipei
Print_ISBN
978-1-4244-4341-3
Electronic_ISBN
978-1-4244-4342-0
Type
conf
DOI
10.1109/IMPACT.2009.5382313
Filename
5382313
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