DocumentCode
3133687
Title
Reduction of inelastic scattering effect by introducing strain-compensated superlattice into GaInAs/GaInP multi-quantum barriers
Author
Loh, Terhoe ; Miyamoto, Tomoyuki ; Kurita, Youichiro ; Koyama, Fumio ; Iga, Kenichi
Author_Institution
Precision & Intell. Lab., Tokyo Inst. of Technol., Japan
fYear
1995
fDate
9-13 May 1995
Firstpage
373
Lastpage
376
Abstract
The effect of inelastic scattering on the electron reflection in multi-quantum barriers has been examined for the first time by using the damped resonant tunneling model. The electron reflectivity deteriorates below unity most significantly at discrete energies in the virtual barrier. The largest dip in reflectivity is about 15% for intraband relaxation time of 0.16 ps. It is also shown that this deterioration can be reduced by utilizing strain-compensated superlattice in the multi-quantum barriers
Keywords
III-V semiconductors; electron relaxation time; gallium arsenide; gallium compounds; indium compounds; interface states; quantum interference phenomena; semiconductor superlattices; surface scattering; tunnelling; 0.16 ps; GaInAs-GaInP; GaInAs/GaInP multi-quantum barriers; damped resonant tunneling model; electron reflection; electron reflectivity; inelastic scattering effect; intraband relaxation time; reflectivity; strain-compensated superlattice; virtual barrier; Electrons; Indium phosphide; Optical scattering; Particle scattering; Quantum well lasers; Reflectivity; Resonance light scattering; Resonant tunneling devices; Semiconductor lasers; Superlattices;
fLanguage
English
Publisher
ieee
Conference_Titel
Indium Phosphide and Related Materials, 1995. Conference Proceedings., Seventh International Conference on
Conference_Location
Hokkaido
Print_ISBN
0-7803-2147-2
Type
conf
DOI
10.1109/ICIPRM.1995.522157
Filename
522157
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