• DocumentCode
    3133767
  • Title

    Frequency analysis of the kink effect in AlInAs/GaInAs HEMTs

  • Author

    Klepser, B -U H ; Patrick, W.

  • Author_Institution
    Lab. for Electromagn. Fields & Microwave Electron., Swiss Federal Inst. of Technol., Zurich, Switzerland
  • fYear
    1995
  • fDate
    9-13 May 1995
  • Firstpage
    389
  • Lastpage
    392
  • Abstract
    A frequency analysis of the transconduction and output conduction of 0.25 μm InP based HEMTs was carried out using S-parameter measurements down to 1 kHz. The advantage of this method is that very low frequency and hf performance is determined using a single measurement sequence. It has been shown that the kink effect in the output characteristics consists of two ranges of a reduced and an increased drain current. Additionally it was found, that while gd,hf increases for more positive gate voltages, gd,dc usually decreases. It has also been shown, that the dc measured transconductance gm,dc is lower than gm,hf. This difference is increased for high drain voltages. The frequency analysis shows that gm,dc is generally decreased at higher drain voltages. Finally, it has been shown that the dispersion output conduction can be up to the GHz range for high drain source voltages
  • Keywords
    III-V semiconductors; S-parameters; aluminium compounds; electric admittance; gallium arsenide; high electron mobility transistors; indium compounds; 0.25 mum; 500 Hz to 500 MHz; AlInAs-GaInAs; AlInAs/GaInAs HEMTs; InP; InP based HEMTs; S-parameter measurements; dc measured transconductance; dispersion output conduction; drain current; drain voltage; frequency analysis; hf performance; kink effect; output characteristics; output conduction; transconduction; very low frequency performance; Frequency measurement; Gain measurement; HEMTs; Hafnium; MODFETs; Pulse measurements; Scattering parameters; Transconductance; Voltage; Wet etching;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Indium Phosphide and Related Materials, 1995. Conference Proceedings., Seventh International Conference on
  • Conference_Location
    Hokkaido
  • Print_ISBN
    0-7803-2147-2
  • Type

    conf

  • DOI
    10.1109/ICIPRM.1995.522161
  • Filename
    522161