Title :
High output power operation of 1.3 μm strained MQW lasers with low threshold currents at high temperature
Author :
Kito, Masahiro ; Sakai, Hideyuki ; Otsuka, Nobuyuki ; Fujihara, Kiyoshi ; Ishino, Masato ; Matsui, Yasushi
Author_Institution :
Semicond. Res. Center, Matsushita Electron. Corp., Osaka, Japan
Abstract :
We have investigated the temperature dependencies of the output power and the threshold current for compressively strained InGaAsP MQW lasers on well number. Smaller well number means larger temperature dependencies of the slope efficiency as well as the threshold current due to enhanced carrier overflow, while greater well number means degradation in crystalline quality that lowers the reliability of the laser. The 1.3 μm strained MQW laser with a compressive strain of 1.0% and 7 wells shows the highest output power of 6.8 mW and the lowest threshold current of 5.5 mA at 85°C, and the lowest variation in output power of 2.0 dB from 25°C to 85°C at the injection current of 50 mA. These characteristics show that the optimized lasers are suitable for light sources of the optical access networks
Keywords :
III-V semiconductors; gallium arsenide; indium compounds; laser reliability; laser transitions; optical transmitters; quantum well lasers; 1.3 μm strained MQW lasers; 1.3 mum; 25 to 85 degC; 5.5 mA; 50 mA; 6.8 mW; InP; compressively strained MQW lasers; crystalline quality degradation; enhanced carrier overflow; high output power operation; high temperature; injection current; light sources; low threshold currents; optical access networks; optimized lasers; output power; reliability; slope efficiency a; temperature dependence; threshold current f; well number; Capacitive sensors; Crystallization; Degradation; Light sources; Optical fiber networks; Power generation; Power lasers; Quantum well devices; Temperature dependence; Threshold current;
Conference_Titel :
Indium Phosphide and Related Materials, 1995. Conference Proceedings., Seventh International Conference on
Conference_Location :
Hokkaido
Print_ISBN :
0-7803-2147-2
DOI :
10.1109/ICIPRM.1995.522191