DocumentCode
3134971
Title
Thermal capacitance matching in 3D many-core architectures
Author
Green, Craig E. ; Fedorov, Andrei G. ; Joshi, Yogendra K.
Author_Institution
George W. Woodruff Sch. of Mech. Eng., Georgia Inst. of Technol., Atlanta, GA, USA
fYear
2011
fDate
20-24 March 2011
Firstpage
110
Lastpage
115
Abstract
While 3D stacked multi-processor technology offers the potential for significant computing advantages, these architectures also face with the significant challenge of small, localized hotspots with very large power dissipation due to the placement of asymmetric cores, heterogeneous devices and performance driven layouts. In this paper, a new thermal management solution is proposed that seeks to maximize the performance of microprocessors with dynamically managed power profiles. To mitigate the non-uniformities in chip temperature profiles resulting from the dynamic power maps, phase change materials (PCMs) with an embedded heat spreader network are strategically positioned near localized hotspots, resulting in a large increase in the local thermal capacitance in these problematic areas. We show that this results in an up-to-twenty-fold increase in the time that a thermally constrained core can operate before a power gating or core migration event is required.
Keywords
microprocessor chips; multiprocessing systems; phase change materials; thermal management (packaging); three-dimensional integrated circuits; 3D many-core architectures; 3D stacked multiprocessor technology; asymmetric cores; chip temperature profiles; core migration event; dynamic power maps; embedded heat spreader network; heterogeneous devices; microprocessors; performance driven layouts; phase change materials; power dissipation; power gating; power profiles; thermal capacitance matching; thermal management solution; Capacitance; Heat sinks; Heating; Phase change materials; Silicon; Three dimensional displays; Core Migration; Hotspot; Multicore;
fLanguage
English
Publisher
ieee
Conference_Titel
Semiconductor Thermal Measurement and Management Symposium (SEMI-THERM), 2011 27th Annual IEEE
Conference_Location
San Jose, CA
ISSN
1065-2221
Print_ISBN
978-1-61284-740-5
Type
conf
DOI
10.1109/STHERM.2011.5767187
Filename
5767187
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