DocumentCode
3138077
Title
Unpinning of Fermi level at InP Schottky diode interfaces produced by novel in situ electrochemical process
Author
Wu, N.-J. ; Hashizume, T. ; Hasegawa, H. ; Amemiya, Y.
Author_Institution
Dept. of Electr. Eng., Hokkaido Univ., Sapporo, Japan
fYear
1995
fDate
9-13 May 1995
Firstpage
813
Lastpage
816
Abstract
The paper demonstrates that the pinning of the Fermi level can be removed at InP metal-semiconductor interfaces produced by the novel in situ electrochemical process. The process consists of anodic etching of InP and subsequent cathodic deposition of metal, both of which are done in situ in the same electrolyte. InP Schottky diodes with various metals (Ag, Sn, Cu, Co, Pd, Ni and Pt) have been formed by using different electrolytes based on chloric or sulfuric acid and containing barrier metal ions. The diodes exhibited nearly thermionic emission characteristics. SBH changed over a wide range from 0.35 eV to 0.86 eV. The Pt/InP diodes gave the highest SBH of 0.86eV which is the highest value ever reported for an intimate metal contact to InP
Keywords
Fermi level; III-V semiconductors; Schottky diodes; electrodeposition; etching; indium compounds; interface states; semiconductor technology; 0.35 to 0.86 eV; Fermi level unpinning; InP Schottky diode interfaces; InP metal-semiconductor interfaces; InP-Ag; InP-Co; InP-Cu; InP-Ni; InP-Pd; InP-Pt; InP-Sn; Pt/InP diodes; anodic etching; barrier metal ions; cathodic deposition; chloric acid; electrolytes; in situ electrochemical process; intimate metal contact; nearly thermionic emission characteristics; sulfuric acid; Electrochemical processes; Electrodes; Etching; Gallium arsenide; Indium phosphide; Schottky barriers; Schottky diodes; Semiconductor diodes; Substrates; Tin;
fLanguage
English
Publisher
ieee
Conference_Titel
Indium Phosphide and Related Materials, 1995. Conference Proceedings., Seventh International Conference on
Conference_Location
Hokkaido
Print_ISBN
0-7803-2147-2
Type
conf
DOI
10.1109/ICIPRM.1995.522268
Filename
522268
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