DocumentCode :
3139668
Title :
Correlated electron phenomena in ultra-low-disorder quantum point contacts and quantum wires
Author :
Reilly, D.J. ; Facer, G.R. ; Dzurak, A.S. ; Kane, B.E. ; Clark, R.G. ; Lumpkin, N.E. ; Pfeiffer, L.N. ; West, K.W.
Author_Institution :
Semicond. Nanofabrication Facility, New South Wales Univ., Sydney, NSW, Australia
fYear :
1999
fDate :
1999
Firstpage :
486
Lastpage :
488
Abstract :
The study of electron interaction effects in one dimensional transport requires heterostructures with ultra-low disorder. We have developed a novel GaAs/AlGaAs structure which avoids the random impurity potential present in conventional surface-gated HEMT devices by using epitaxially grown gates to produce an enhancement mode FET. Our quantum point contacts (QPCs) exhibit almost ideal conductance quantisation, however, below 2e2/h additional structure is observed. Such structure has also been seen in QPCs fabricated from ultra-high-mobility surface gated HEMTs and has been interpreted as evidence for a spin-correlated state. In our quantum wire devices this additional structure is further enhanced, indicating that the effective length of the 1D region may be a significant factor in determining the strength of correlation
Keywords :
III-V semiconductors; aluminium compounds; carrier density; electron correlations; gallium arsenide; high electron mobility transistors; interface states; quantum point contacts; semiconductor quantum wires; two-dimensional electron gas; GaAs-AlGaAs; GaAs/AlGaAs structure; almost ideal conductance quantisation; correlated electron phenomena; enhancement mode FET; epitaxially grown gates; one dimensional transport; quantum wire devices; quantum wires; random impurity potential; spin-correlated state; surface-gated HEMT devices; ultra-low-disorder quantum point contacts; Carrier confinement; Charge carrier density; Electron mobility; FETs; Gallium arsenide; HEMTs; Impurities; Ohmic contacts; Voltage; Wires;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Optoelectronic and Microelectronic Materials Devices, 1998. Proceedings. 1998 Conference on
Conference_Location :
Perth, WA
Print_ISBN :
0-7803-4513-4
Type :
conf
DOI :
10.1109/COMMAD.1998.791696
Filename :
791696
Link To Document :
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