Title :
An improved probe sharpening technique (microelectronics failure analysis)
Author_Institution :
Tektronix Inc., Beaverton, OR, USA
Abstract :
An electrochemical probe-sharpening technique with useful microelectronics applications is discussed. This technique was originally designed for scanning tunneling microscope tips. Probe tips produced by the technique are both sharp and strong. In addition, the tip radius is easily set by monitoring current flow during the etch, making it possible to automate the procedure. A circuit for this purpose is given.<>
Keywords :
electron probes; etching; failure analysis; integrated circuit testing; scanning tunnelling microscopy; electrochemical probe-sharpening technique; etch; failure analysis; microelectronics applications; monitoring current flow; scanning tunneling microscope tips; Circuits; Etching; Failure analysis; Geometrical optics; Microelectronics; Microscopy; Probes; Tungsten; Tunneling; Voltage;
Conference_Titel :
Reliability Physics Symposium, 1990. 28th Annual Proceedings., International
Conference_Location :
New Orleans, LA, USA
DOI :
10.1109/RELPHY.1990.66064
