Fabrication of micromechanical structures with a new electrodeless electrochemical etch stop

Author

Ashruf, C.M.A. ; Rench, P. J I ; Sarro, P.M. ; Nagao, M. ; Esashi, M.

Author_Institution

Dept. of Electr. Eng., Delft Univ. of Technol., Netherlands

Volume

1

fYear

1997

fDate

16-19 Jun 1997

Firstpage

703

Abstract

A new electrochemical etch stop which does not require external contacts or power source has been studied. This technique yields a simple and effective method to achieve an etch-stop. The passivation voltage is generated internally in a Au/Cr/nSi/TMAH cell. Test structures have been used to examine the conditions required for the etch stop. Silicon membranes have been fabricated using this etch stop technique to demonstrate the applicability to microsensors

Keywords

electrochemistry; elemental semiconductors; etching; membranes; micromachining; microsensors; passivation; semiconductor device testing; silicon; Au-Cr-Si; Au/Cr/nSi/TMAH cell; Si; Si membranes; bulk micromachining; electrodeless electrochemical etch stop; micromechanical structure fabrication; microsensors; passivation voltage; test structures; Biomembranes; Chromium; Etching; Fabrication; Gold; Micromechanical devices; Passivation; Silicon; Testing; Voltage;

fLanguage

English

Publisher

ieee

Conference_Titel

Solid State Sensors and Actuators, 1997. TRANSDUCERS '97 Chicago., 1997 International Conference on

Conference_Location

Chicago, IL

Print_ISBN

0-7803-3829-4

Type

conf

DOI

10.1109/SENSOR.1997.613749

Filename

613749