Title :
A Parallel Algorithm for Computer Simulation of Electrocardiogram Based on MPI
Author :
Shen, Wenfeng ; Lu, Weijia ; Wei, Daming ; Xu, Weimin ; Zhu, Xin ; Yuan, Shizhong
Author_Institution :
Biomed. Inf. Technol. Lab., Univ. of Aizu, Aizu-Wakamatsu, Japan
Abstract :
This paper presents a parallel algorithm for computer simulation of Electrocardiogram (ECG) based on a 3-dimensional (3D) whole-heart model. The computer heart model includes approximately 50,000 discrete elements (model cells) inside a torso model represented by 344 nodal points with 684 triangle meshes. The Poison question is applied to the volume conductor problem for simulation of ECG, which involves a maximum of about 50,000 electric current dipole sources and four boundaries including the torso surface and three surfaces of heart. A parallel algorithm was introduced to solve this problem based on Message Passing Interface (MPI). An implementation is conducted with a cluster computer system consisting of up to eight PCs, each of which has a dual-core processor. It was shown that the speedup is close to 2 in one PC and close to 8 with 8 processors, as compared to the serial algorithm. This study demonstrates a useful way of parallel computing in biomedical simulation study.
Keywords :
application program interfaces; electrocardiography; message passing; parallel algorithms; physiological models; stochastic processes; 3D whole-heart model; MPI; Poison question; biomedical simulation study; cluster computer system; computer heart model; computer simulation; dual-core processor; electric current dipole sources; electrocardiogram; message passing interface; parallel algorithm; parallel computing; torso model; volume conductor problem; Computational modeling; Computer simulation; Conductors; Current; Electrocardiography; Heart; Message passing; Parallel algorithms; Torso; Toxicology; MPI; computer simulation; whole-heart model;
Conference_Titel :
Computer and Information Science, 2009. ICIS 2009. Eighth IEEE/ACIS International Conference on
Conference_Location :
Shanghai
Print_ISBN :
978-0-7695-3641-5
DOI :
10.1109/ICIS.2009.110