DocumentCode
3144074
Title
Instabilities in oxide semiconductor transparent thin film transistors
Author
Conley, J.F., Jr.
Author_Institution
Sch. of Electr. Eng. & Comput. Sci., Oregon State Univ., Corvallis, OR, USA
fYear
2009
fDate
18-22 Oct. 2009
Firstpage
50
Lastpage
55
Abstract
New amorphous oxide semiconductor transparent thin film transistors (TTFTs) exhibit good mobility (5 to >50 cm2/V-sec), are transparent, and can be processed at low temperatures. They show great promise for high performance large area electronics applications such as flexible electronics, transparent electronics, and analog current drivers for OLED displays. An overview of TFT operation, expected reliability concerns, and an up to date review of recently emerging work on the stability of these devices will be presented.
Keywords
amorphous semiconductors; flexible electronics; reviews; semiconductor device reliability; semiconductor thin films; thin film transistors; transparency; OLED displays; TTFT device stability; amorphous oxide semiconductor transparent thin film transistor; analog current drivers; flexible electronics; large area electronics; mobility; reliability; review; transparent electronics; Active matrix liquid crystal displays; Amorphous materials; Bonding; Crystalline materials; Crystallization; Flat panel displays; Grain boundaries; Semiconductor materials; Stability; Thin film transistors;
fLanguage
English
Publisher
ieee
Conference_Titel
Integrated Reliability Workshop Final Report, 2009. IRW '09. IEEE International
Conference_Location
S. Lake Tahoe, CA
ISSN
1930-8841
Print_ISBN
978-1-4244-3921-8
Electronic_ISBN
1930-8841
Type
conf
DOI
10.1109/IRWS.2009.5383033
Filename
5383033
Link To Document