DocumentCode :
3153323
Title :
Fast Embedded Characterization of FEOL Variations in MOS Devices
Author :
Rigaud, F. ; Portal, J.M. ; Dreux, P. ; Vast, J. ; Aziza, H. ; Bas, G.
Author_Institution :
Lab. Mater. et Microelectron. de Provence, CNRS, Marseille
fYear :
2009
fDate :
March 30 2009-April 2 2009
Firstpage :
205
Lastpage :
208
Abstract :
The objective of this paper is to present a test chip based on embedded ring oscillators (RO) measurement with its associated extraction algorithm to characterize length and width variations and to discriminate them from others FEOL variations. A brief overview of the structure, designed in a ST-Microelectronics 90nm technology, is given with emphasis on the ROs geometry with their biasing conditions and the measurement circuit. Comparison of simulated values versus estimated ones is given and confirms the ability of the structure to characterize FEOL variations. MOS width and length are well estimated regardless the others FEOL deviations that can be also detected.
Keywords :
MOSFET; digital integrated circuits; nanoelectronics; oscillators; semiconductor device measurement; semiconductor device models; semiconductor device testing; FEOL variation; MOS device width; ST-microelectronics design; associated extraction algorithm; embedded RO measurement circuit; embedded ring oscillator test structure; size 90 nm; Circuit testing; Counting circuits; Frequency measurement; Geometry; MOS devices; Manufacturing processes; Ring oscillators; Semiconductor device manufacture; Semiconductor device measurement; Threshold voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microelectronic Test Structures, 2009. ICMTS 2009. IEEE International Conference on
Conference_Location :
Oxnard, CA
Print_ISBN :
978-1-4244-4259-1
Type :
conf
DOI :
10.1109/ICMTS.2009.4814642
Filename :
4814642
Link To Document :
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