DocumentCode
3160971
Title
Electrical properties of PZT thin films with Ir and IrO2 electrodes
Author
Nakamura, Takashi ; Nakao, Yuichi ; Kamisawa, AKira ; Takasu, Hidemi
Author_Institution
Rohm Co. Ltd., Kyoto, Japan
fYear
1991
fDate
33457
Firstpage
547
Lastpage
550
Abstract
The development of ferroelectric memory devices requires an understanding of the fatigue properties of ferroelectric thin films. PZT thin films by sol-gel method on Pt/Ti with residual polarization reduced by continuous polarization reversal about 108 cycles. In this paper, we regard Ir, IrO2 and these layer films as electrode materials and have evaluated the electric characteristic of PZT thin film capacitors. Regarding the ferroelectric material, we used PZT(Zr/Ti=52/48) by sol-gel method. By using Ir and IrO2 electrodes, the diffusion barrier effect becomes very good, therefore they can prevent Pb and other elements from diffusing into the electrode and polycrystalline silicon (poly-Si). PZT thin films using Ir/IrO2 layer electrodes show no fatigue up to 1012 cycles of ±5 V switching pulses
Keywords
ceramic capacitors; dielectric polarisation; diffusion barriers; fatigue; ferroelectric capacitors; ferroelectric devices; ferroelectric materials; ferroelectric storage; ferroelectric switching; ferroelectric thin films; iridium; iridium compounds; lead compounds; piezoceramics; sol-gel processing; thin film capacitors; -5 V; 5 V; Ir electrodes; Ir/IrO2 layer electrodes; IrO2 electrodes; PZT thin film capacitors; PZT thin films; PZT-Ir-IrO2; PbZrO3TiO3-Ir-IrO2; Pt/Ti; continuous polarization reversal; diffusion barrier effect; electrical properties; fatigue properties; ferroelectric memory device; ferroelectric thin films; poly-Si; polycrystalline silicon; residual polarization; sol-gel method; switching pulse; Capacitors; Electric variables; Electrodes; Fatigue; Ferroelectric films; Ferroelectric materials; Polarization; Silicon; Thin film devices; Transistors;
fLanguage
English
Publisher
ieee
Conference_Titel
Applications of Ferroelectrics, 1994.ISAF '94., Proceedings of the Ninth IEEE International Symposium on
Conference_Location
University Park, PA
Print_ISBN
0-7803-1847-1
Type
conf
DOI
10.1109/ISAF.1994.522426
Filename
522426
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