Title :
OPC feature extraction method from reticle SEM image
Author :
Ikeda, T. ; Miyano, Y. ; Kotani, T. ; Shibata, T. ; Ikenaga, O.
Author_Institution :
Process & Manuf. Eng. Center, Toshiba Corp., Yokohama, Japan
Abstract :
Authors developed the method to extract automatically the features of OPC shape from reticle SEM images with high accuracy, using combination of discriminant analysis and non-linear curve-fitting.
Keywords :
curve fitting; feature extraction; photolithography; proximity effect (lithography); reticles; scanning electron microscopy; OPC feature extraction; discriminant analysis; nonlinear curve fitting; photolithography; reticle SEM image; Area measurement; Error correction; Feature extraction; Gravity; Image analysis; Lithography; Manufacturing processes; Position measurement; Semiconductor device manufacture; Shape measurement;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2002. Digest of Papers. Microprocesses and Nanotechnology 2002. 2002 International
Conference_Location :
Tokyo, Japan
Print_ISBN :
4-89114-031-3
DOI :
10.1109/IMNC.2002.1178520
