Title :
Study on the optimization of high transmittance attenuated phase-shifting mask by design of experiment
Author :
Wen-an Leong ; Hsien-yun Lin ; Wen-long Yeh
Author_Institution :
Inst. of Appl. Chem., Nat. Chiao Tung Univ., Hsinchu, Taiwan
Abstract :
Without changing exposure source, the size of device can be reduced by resolution enhancement techniques (RETs). The application of design of experiment (DOE) can increase the process latitude by optimizing parameters and process settings with no extra cost. The using of optical proximity correction (OPC) can correct the pattern distortion of resist effectively.
Keywords :
design of experiments; light transmission; optimisation; phase shifting masks; photoresists; proximity effect (lithography); design of experiment; exposure source; high transmittance attenuated phase-shifting mask; optical proximity correction; optimization; pattern distortion; process latitude; process settings; resist; resolution enhancement techniques; Apertures; Design optimization; Fabrication; Optical arrays; Optical attenuators; Optical distortion; Optical scattering; Resists; Temperature; US Department of Energy;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2002. Digest of Papers. Microprocesses and Nanotechnology 2002. 2002 International
Conference_Location :
Tokyo, Japan
Print_ISBN :
4-89114-031-3
DOI :
10.1109/IMNC.2002.1178566
