DocumentCode :
316517
Title :
Formation of Mo Silicide on Poly-Si Field Emitters for Improved Emission Stability
Author :
Uh, Hyung Soo ; Park, Byung Gook ; Lee, Jong Duk
Author_Institution :
Inter-University Semiconductor Research Center(lSRC), Seoul National University
fYear :
1997
fDate :
17-21 Aug. 1997
Firstpage :
371
Lastpage :
375
Keywords :
Annealing; Gases; Oxidation; Silicides; Silicon; Stability; Surface contamination; Surface morphology; Temperature; Thermal conductivity;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Vacuum Microelectronics Conference, 1997. Technical Digest., 1997 10th International
Conference_Location :
Kyongju, Korea
Print_ISBN :
0-7803-3786-7
Type :
conf
DOI :
10.1109/IVMC.1997.627598
Filename :
627598
Link To Document :
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