Subwavelength antireflection gratings for photovoltaic cells in visible and near-infrared wavelengths

Author

Kanamori, Y. ; Kobayashi, K. ; Yugami, H. ; Hane, K.

Author_Institution

Dept. of Mechatronics & Precision Eng., Tohoku Univ., Sendai, Japan

fYear

2002

fDate

6-8 Nov. 2002

Firstpage

182

Lastpage

183

Abstract

In this study, we have fabricated a two-dimensional antireflection subwavelength grating (SWG) on a GaSb substratefor application to a photovoltaic cell. The SWG has consisted of 350 nm period tapered grating. In the fabrication, electron beam (EB) lithography and fast atom beam (FAB) etching have been used. We have demonstrated that the SWG works well for reducing the reflection even at the temperature of 240/spl deg/C. To our knowledge, the SWG is fabricated on the GaSb substrate for the first time.

Keywords

antireflection coatings; diffraction gratings; electron beam lithography; solar cells; sputter etching; 240 degC; GaSb; GaSb substrate; electron beam lithography; fast atom beam etching; photovoltaic cell; tapered grating; two-dimensional antireflection subwavelength grating; Atomic beams; Electron beams; Etching; Fabrication; Gratings; Lithography; Optical reflection; Photovoltaic cells; Reluctance generators; Temperature;

fLanguage

English

Publisher

ieee

Conference_Titel

Microprocesses and Nanotechnology Conference, 2002. Digest of Papers. Microprocesses and Nanotechnology 2002. 2002 International

Conference_Location

Tokyo, Japan

Print_ISBN

4-89114-031-3

Type

conf

DOI

10.1109/IMNC.2002.1178604

Filename

1178604