DocumentCode :
316546
Title :
Field Emission from Undoped Polycrystalline Diamond Deposited by MPCVD at 520-665 C
Author :
Li, Yanbo ; Aslam, Dean M. ; Kwon, Sang J.
Author_Institution :
Department of Electrical Engineering, Michigan State University
fYear :
1997
fDate :
17-21 Aug. 1997
Firstpage :
509
Lastpage :
512
Keywords :
Conductive films; Electron emission; Plasma density; Plasma displays; Plasma immersion ion implantation; Plasma measurements; Plasma temperature; Rough surfaces; Surface roughness; Temperature distribution;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Vacuum Microelectronics Conference, 1997. Technical Digest., 1997 10th International
Conference_Location :
Kyongju, Korea
Print_ISBN :
0-7803-3786-7
Type :
conf
DOI :
10.1109/IVMC.1997.627635
Filename :
627635
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=316546
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