Stable high-density FD/SOI SRAM with selective back-gate bias using dual buried oxide

The proposed selective-back gate bias technique using dual BOX improves SRAM stability, reduce leakage power, and enhances sub-array access speed while preserving overall area efficiency. TCAD simulations show that nominal Read SNM is improved by 37%, and the cell is very immune to process variations such as RDF, TSi, and TBOX. Thus, it is very suitable for high-performance on-chip cache and SOC embedded applications beyond 45 nm FD/SOI technologies.