DocumentCode :
3167326
Title :
A revisited pseudo-MOSFET model for ultrathin SOI films
Author :
Rodriguez, N. ; Cristoloveanu, S. ; Gámiz, F.
Author_Institution :
Dept. de Electron., Univ. of Granada, Granada
fYear :
2008
fDate :
6-9 Oct. 2008
Firstpage :
65
Lastpage :
66
Abstract :
The pseudo-MOS transistor (Psi-MOSFET) is a quick technique for monitoring SOI wafers. Based on Poisson numerical simulations, we derive updated models for the characterization of ultrathin films, accounting for the density of traps of passivated and nonpassivated surfaces. These analytical models match the experimental results and are useful for accurate parameter extraction.
Keywords :
MOSFET; Poisson equation; semiconductor device models; semiconductor thin films; silicon-on-insulator; Poisson numerical simulations; Si; nonpassivated surfaces; passivated surfaces; pseudoMOSFET model; ultrathin SOI films; Conference proceedings; Decision support systems; Quadratic programming;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
SOI Conference, 2008. SOI. IEEE International
Conference_Location :
New Paltz, NY
ISSN :
1078-621X
Print_ISBN :
978-1-4244-1954-8
Electronic_ISBN :
1078-621X
Type :
conf
DOI :
10.1109/SOI.2008.4656296
Filename :
4656296
Link To Document :
بازگشت