Title :
Fast extraction for 3-D inductance and resistance in interconnects
Author :
Yang, Liu ; Wang, Zeyi
Author_Institution :
Dept. of Comput. Sci. & Technol., Tsinghua Univ., Beijing, China
fDate :
29 June-1 July 2002
Abstract :
With the development of VLSI circuits, the feature size has been decreased to the deep sub-micron level, and working frequency has reached 3 GHz. IC performance depends directly on parasitic interconnect inductance and resistance. In this paper, we propose a format to describe 3D hierarchical interconnects, and an approach automatically partitioning filaments in consideration of the skin effect. An improved multipole accelerative computation based on the non-uniform cube subdivision is implemented. Numerical results show that the extractor presented here runs several to more than ten times faster than the FastHenry (M. Kamon et al., IEEE Trans. on Microwave Theory and Techniques, pt. 2, pp. 1750-1758, 1994) with comparable accuracy.
Keywords :
VLSI; electric resistance; inductance; integrated circuit interconnections; integrated circuit modelling; numerical analysis; poles and zeros; skin effect; 3 GHz; 3D hierarchical interconnects; FastHenry; VLSI circuits; automatic filament partitioning; fast 3D inductance extraction; fast 3D resistance extraction; feature size; interconnects; multipole accelerative computation; nonuniform cube subdivision; parasitic interconnect inductance; parasitic interconnect resistance; skin effect; working frequency; Acceleration; Boundary element methods; Conductors; Delay; Frequency; Inductance; Integrated circuit interconnections; Skin effect; Very large scale integration; Voltage;
Conference_Titel :
Communications, Circuits and Systems and West Sino Expositions, IEEE 2002 International Conference on
Print_ISBN :
0-7803-7547-5
DOI :
10.1109/ICCCAS.2002.1179028