Title :
Characteristics of submicron MOS varactors
Author :
Jenkins, Keith A. ; Ainspan, Herschel
Author_Institution :
IBM T.J. Watson Res. Center, Yorktown Heights, NY, USA
Abstract :
An experimental study of the capacitive parameters of submicron accumulation-mode MOS varactors is reported. Varactors are studied as a function of channel length and width. As the device channels are scaled to smaller and smaller dimensions to achieve higher frequency circuits, the capacitance tuning range decreases because of a relative increase of fixed capacitance. At the same time, the Q-factor of the varactor increases, thus requiring the circuit designer to choose the best gate length to optimize both parameters.
Keywords :
MOS capacitors; Q-factor; varactors; Q-factor; accumulation-mode MOS varactors; capacitance tuning; Capacitance; Circuit optimization; Electrical resistance measurement; Frequency measurement; Impedance; Inductors; Q factor; Resonant frequency; Varactors; Voltage-controlled oscillators;
Conference_Titel :
Silicon Monolithic Integrated Circuits in RF Systems, 2006. Digest of Papers. 2006 Topical Meeting on
Print_ISBN :
0-7803-9472-0
DOI :
10.1109/SMIC.2005.1587923