DocumentCode
3174471
Title
Thick film, LTCC or silicon microhotplate for gas sensor and other applications
Author
Jain, Y.K. ; Khanna, V.K.
fYear
2007
fDate
16-20 Dec. 2007
Firstpage
714
Lastpage
717
Abstract
This paper presents the development of Pt heater using thick film, LTCC and silicon technologies. Miniaturized alumina hotplate can be used for sintering of metallized semiconductor devices and multiple gas sensor applications. For sensor application, thick film Pt heater was fabricated on back of the alumina substrate of size 5.0 mm x 5.0 mm x 0.6 mm by precise screen printing, drying and firing processes. The Au sensor electrodes were also printed, dried and fired in a similar way. Wire connections were made to the pads of Pt heater and sensor electrodes using parallel gap welder. Pt heater was operated up to about 600 degree celsius by applying electrical power. Wire connections of Ag alloy wire were found to be stable up to 700 degree celsius. For sensing LPG, smoke, this size of heater requires a power of about 2.5 W. Miniaturized alumina hot plate of size 12.5 mm x 12.5 mm x 0.6 mm has also been developed. Considering the low power requirement for modern sensors of the order of 0.5W or less, LTCC or Si based microhotplates are to be used. Silicon microhotplate has been developed at CEERI. Development work on microhotplate using LTCC has been started.
Keywords
aluminium compounds; gas sensors; silicon; thick film sensors; LTCC; alumina substrate; multiple gas sensor; silicon microhotplate; thick film; wire connections; Electrodes; Gas detectors; Metallization; Semiconductor devices; Silicon; Substrates; Thermal sensors; Thick film sensors; Thick films; Wire; LTCC; Microhotplate; Silicon sensor; Thick film Pt. heater;
fLanguage
English
Publisher
ieee
Conference_Titel
Physics of Semiconductor Devices, 2007. IWPSD 2007. International Workshop on
Conference_Location
Mumbai
Print_ISBN
978-1-4244-1728-5
Electronic_ISBN
978-1-4244-1728-5
Type
conf
DOI
10.1109/IWPSD.2007.4472620
Filename
4472620
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