Title :
Fabrication of 3-D PDMS nano-template for UV nano-imprint lithography and micro contact printing by means of grey scale electron beam lithography
Author :
Rudzinski, Axel ; Barth, Ulrich ; Kahl, Michael ; Huhn, B.-A. ; Kopetz, Stefan ; Rabe, Erik ; Neyer, Andreas
Author_Institution :
Raith GmbH, Dortmund
Abstract :
The fabrication process of PDMS embossing tools for nano scale pattern transfer like it is used for step and flash imprint lithography and micro contact printing has been investigated. We added an electroplating process to achieve a mother mask for the PDMS tool that withstands a lifetime use without any kind of abrasion. The work will focus on the pattern preparation and the process step of 3-dimensional e-beam lithography. Furthermore the realization into nickel and subsequently molding into PDMS will be described.
Keywords :
electron beam lithography; electroplating; embossing; nanolithography; polymers; soft lithography; 3D PDMS nanotemplate; UV nanoimprint lithography; electroplating process; embossing tools; fabrication process; flash imprint lithography; grey scale electron beam lithography; micro contact printing; mother mask; nano scale pattern transfer; pattern preparation; Costs; Electron beams; Fabrication; Lead; Lithography; Manufacturing processes; Nickel; Printing; Proximity effect; Resists; Electron beam lithography; PDMS; nano-imprint; nanoelectroplating; three-dimensional lithography;
Conference_Titel :
Physics of Semiconductor Devices, 2007. IWPSD 2007. International Workshop on
Conference_Location :
Mumbai
Print_ISBN :
978-1-4244-1727-8
Electronic_ISBN :
978-1-4244-1728-5
DOI :
10.1109/IWPSD.2007.4472651
