Title :
Controlled growth of complex oxide thin films
Author :
Blank, Dave H.A.
Author_Institution :
Facultly of Sci. & Technol., Twente Univ., Enschede, Netherlands
Abstract :
Pulsed laser deposition (PLD) is attractive for research on complex oxides. The growth of oxide materials with PLD is the control of the surface morphology. For most materials it is necessary to control the thickness and roughness of the thin films down to an atomic scale. Such well-controlled growth can also be used to manufacture artificially layered structures of different materials with different properties.
Keywords :
optical films; optical materials; pulsed laser deposition; surface morphology; thin films; atomic scale; complex oxide thin films; controlled growth; oxide material; pulsed laser deposition; surface morphology; Atomic beams; Atomic layer deposition; Optical materials; Optical pulses; Pulsed laser deposition; Rough surfaces; Surface morphology; Surface roughness; Thickness control; Transistors;
Conference_Titel :
Lasers and Electro-Optics Europe, 2003. CLEO/Europe. 2003 Conference on
Print_ISBN :
0-7803-7734-6
DOI :
10.1109/CLEOE.2003.1313613
