• DocumentCode
    31808
  • Title

    Study of Excess Noise Factor Under Nonlocal Effect in Avalanche Photodiodes

  • Author

    Sun, Wen ; Zheng, Xiaoquan ; Campbell, Joe C.

  • Author_Institution
    Department of Electrical and Computer Engineering, University of Virginia, Charlottesville, VA, USA
  • Volume
    26
  • Issue
    21
  • fYear
    2014
  • fDate
    Nov.1, 1 2014
  • Firstpage
    2150
  • Lastpage
    2153
  • Abstract
    Avalanche photodiodes with thin multiplication regions exhibit a linear relationship between F(M) and M, which differs from the local-field model. This letter presents a study of the relationship between F(M) with M when nonlocal effects are significant. Systematic Monte Carlo simulations on different avalanche photodiodes have been carried out to support the analytical model.
  • Keywords
    Avalanche photodiodes; Impact ionization; Monte Carlo methods; Noise; Avalanche photodiode; Monte Carlo simulation; excess noise factor; impact ionization;
  • fLanguage
    English
  • Journal_Title
    Photonics Technology Letters, IEEE
  • Publisher
    ieee
  • ISSN
    1041-1135
  • Type

    jour

  • DOI
    10.1109/LPT.2014.2348914
  • Filename
    6879478