Self-consistent simulation of VCSELs using MINILASE

Author

Klein, B. ; Oyafuso, F. ; Register, L.F. ; Hess, K. ; Deppe, D.G.

Author_Institution

Coordinated Sci. Lab., Illinois Univ., Urbana, IL, USA

fYear

1999

fDate

26-27 July 1999

Abstract

The simulation method presented above will be applied to various VCSEL design configurations in order to obtain comparative information about the utility of certain design features. We show the three dimensional fundamental mode pattern of a standard oxide confined VCSEL with a l /spl mu/m diameter oxide aperture which occupies the first DBR layer. Design parameters which will be tested include oxide placement, oxide thickness, tapering of the oxide tip, and DBR design, amongst others.

Keywords

distributed Bragg reflector lasers; laser modes; laser theory; optical design techniques; semiconductor device models; semiconductor lasers; surface emitting lasers; 1 mum; MINILASE; VCSELs; design features; design parameters; first DBR layer; oxide placement; oxide thickness; oxide tip tapering; self-consistent simulation; standard oxide confined VCSEL; three dimensional fundamental mode pattern; Integral equations; Laser modes; Laser theory; Maxwell equations; Poisson equations; Quantum well lasers; Semiconductor lasers; Silicon devices; Surface emitting lasers; Vertical cavity surface emitting lasers;

fLanguage

English

Publisher

ieee

Conference_Titel

Nanostructures and Quantum Dots/WDM Components/VCSELs and Microcavaties/RF Photonics for CATV and HFC Systems, 1999 Digest of the LEOS Summer Topical Meetings

Conference_Location

San Diego, CA, USA

Print_ISBN

0-7803-5633-0

Type

conf

DOI

10.1109/LEOSST.1999.794699

Filename

794699