DocumentCode :
3198240
Title :
User verify and disturb mechanisms in a 65nm flash FPGA
Author :
Jia, James Yingbo ; Singaraju, Pavan ; Dhaoui, Fethi ; Newell, Rich ; Liu, Patty ; Micael, Habtom ; Traas, Michael ; Sammie, Salim ; Wang, JJ ; Hawley, Frank ; McCollum, John ; Werner, Van den Abeelen ; Hamdy, Esmat ; Hu, Chenming
Author_Institution :
Microsemi Corp., Mountain View, CA, USA
fYear :
2011
fDate :
16-20 Oct. 2011
Firstpage :
47
Lastpage :
49
Abstract :
We present a study of the disturb mechanism encountered in a novel user verify technique that can be used to enhance the security of a Field Programmable Gate Array (FPGA) fabricated with a 65 nm embedded-Flash process. Two disturb mechanisms are studied in detail. The intrinsic disturb mode is related to Fowler-Nordheim (FN) tunneling, whereas an extrinsic disturb mode involves traps which enhance the tunneling probability. The effect of single and multiple positive charges is simulated. It is concluded that multiple charges are involved during disturb to explain the observed extrinsic behavior. Accelerated testing predicts that 10k verify operations can be performed with an error rate less than 1ppm for a five million gate FPGA, equivalent to a FIT rate of approx. 0.001 failures per 109 hours per million gates when applied over a 20 year lifetime. The low verify-induced error rate makes the technique suitable for enhancing security by providing timely detection of malicious tampering attacks.
Keywords :
field programmable gate arrays; flash memories; FPGA; Fowler-Nordheim tunneling; accelerated testing; disturb mechanisms; field programmable gate array; low verify-induced error rate; malicious tampering attacks; positive charges; size 65 nm; user verify; Arrays; Error analysis; Field programmable gate arrays; Logic gates; Nonvolatile memory; Security; Tunneling;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Integrated Reliability Workshop Final Report (IRW), 2011 IEEE International
Conference_Location :
South Lake Tahoe, CA
ISSN :
1930-8841
Print_ISBN :
978-1-4577-0113-9
Type :
conf
DOI :
10.1109/IIRW.2011.6142586
Filename :
6142586
Link To Document :
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