Polymer Ultra-violet Light Filter for MEMS Fabrication

Author

Korivi, N.S. ; Yellampalli, S. ; Jiang, L.

Author_Institution

Louisiana State Univ. Baton Rouge, Baton Rouge

fYear

2008

fDate

16-18 March 2008

Firstpage

311

Lastpage

314

Abstract

The development of micro-electromechanical systems (MEMS) is based on the fabrication of microscale structures and features in a photo-sensitive polymer or photoresist, by selectively exposing it to ultra-violet (UV) light. The standard UV sources used in MEMS fabrication have broadband UV light output in the range of 305 nm to 436 nm. The use of such sources causes problems in some situations due to unequal absorption of different components of UV light in photoresist material, causing improper UV dose distribution in the different regions of the photoresist. This paper reports the development of a novel polymer filter that can attenuate the different UV wavelength components, allowing for a more uniform UV dose to be delivered to all regions of the photoresist.

Keywords

micromechanical devices; optical filters; photoresists; polymers; MEMS fabrication; microelectromechanical systems; microscale structures; photoresist; photosensitive polymer; polymer ultraviolet light filter; Electromagnetic wave absorption; Fabrication; Microelectromechanical devices; Microelectromechanical systems; Micromechanical devices; Optical filters; Optical materials; Optical surface waves; Polymers; Resists; High Aspect Ratio Microstructures; MEMS Fabrication; Photolithography; UV Filter;

fLanguage

English

Publisher

ieee

Conference_Titel

System Theory, 2008. SSST 2008. 40th Southeastern Symposium on

Conference_Location

New Orleans, LA

ISSN

0094-2898

Print_ISBN

978-1-4244-1806-0

Electronic_ISBN

0094-2898

Type

conf

DOI

10.1109/SSST.2008.4480244

Filename

4480244