• DocumentCode
    3200901
  • Title

    Characteristics of surface film on slipring in the low atmospheric pressure

  • Author

    Ueno, Takahiro ; Sawa, Koichiro

  • Author_Institution
    Electr. Lab. Center, Nippon Inst. of Technol., Saitama, Japan
  • fYear
    1999
  • fDate
    4-6 Oct. 1999
  • Firstpage
    169
  • Lastpage
    174
  • Abstract
    The surface film of slipring is important for good sliding contact of brush and slipring. This film formation is influenced by the brush material, the atmospheric temperature, humidity and atmospheric pressure. The condition of sliding contact and surface film can be guessed by the measurement of contact voltage drops. The contact resistance is classified into constriction resistance and film resistance. From the results of this paper, in the low atmospheric pressure, the oxidized film scarcely grew on the slipring surface, so the contact resistance is thought to be generated mainly by the current constriction. Further, it can be found that the resistance in the low atmospheric pressure was only constriction resistance, and that the resistance in the air was composed of the constriction resistance and film resistance. The wear length of the test brushes, depending upon the brush grade, was many times larger than the wear in the air.
  • Keywords
    brushes; contact resistance; electrical contacts; wear; atmospheric pressure; atmospheric temperature; brush grade; brush material; constriction resistance; contact voltage drops; current constriction; film resistance; humidity; sliding contact; slipring; surface film; test brushes; wear length; Atmosphere; Atmospheric measurements; Brushes; Commutation; Contact resistance; Electrical resistance measurement; Humidity; Surface resistance; Temperature; Voltage measurement;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electrical Contacts, 1999. Proceedings of the Forty-Fifth IEEE Holm Conference on
  • Conference_Location
    Pittsburgh, PA, USA
  • Print_ISBN
    0-7803-5549-0
  • Type

    conf

  • DOI
    10.1109/HOLM.1999.795944
  • Filename
    795944