DocumentCode
3202883
Title
Propagation loss of amorphous silicon optical waveguides at the 0.8 µm-wavelength range
Author
Asukai, Takahiro ; Inamoto, Makoto ; Maruyama, Takeo ; Iiyama, Koichi ; Ohdaira, Keisuke ; Matsumura, Hideki
Author_Institution
Natural Sci. & Technol., Kanazawa Univ., Ishikawa, Japan
fYear
2010
fDate
1-3 Sept. 2010
Firstpage
269
Lastpage
271
Abstract
We fabricated optical waveguides using amorphous silicon deposited by catalytic chemical vapor deposition method. The waveguides were fabricated by photolithography and wet chemical etching. The propagation loss of 15 dB/cm at 830 nm was measured.
Keywords
amorphous semiconductors; chemical vapour deposition; elemental semiconductors; etching; optical fabrication; optical waveguides; photolithography; silicon; Si; amorphous silicon optical waveguides; catalytic chemical vapor deposition; photolithography; propagation loss; waveguides fabrication; wavelength 0.8 mum; wet chemical etching; Loss measurement; Optical device fabrication; Optical fibers; Propagation losses; Silicon; Amorphous silicon; Cat-CVD; optical waveguides; optoelectronics integrated circuit; silicon photonics;
fLanguage
English
Publisher
ieee
Conference_Titel
Group IV Photonics (GFP), 2010 7th IEEE International Conference on
Conference_Location
Beijing
Print_ISBN
978-1-4244-6344-2
Type
conf
DOI
10.1109/GROUP4.2010.5643356
Filename
5643356
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