Title :
Investigation of spark gap discharge in a regime of very high repetitition rate
Author :
Rahaman, Hafizur ; Nam, S.H. ; Kim, S.H. ; Park, S.S. ; Kim, S.H. ; Heo, H. ; Choi, O.R. ; Kim, Scott C. ; Frank, Klaus
Author_Institution :
Pohang Accel. Lab., Pohang, South Korea
fDate :
June 28 2009-July 2 2009
Abstract :
It is our interest to design and develop a high power pulser system employing microplasma discharge in a spark gap system. The type of discharge generates short electric pulses capable of both the characteristics of high repetition rate and fast rise time. Such a switch pulser has wide applications in the industry. An efficient electrical discharge in the spark gap is very important for the switching operation. The regime of operation utilizes the residual plasma in the inter pulse recovery of the spark gap to increase the repetition rate. Therefore, the mechanisms of the discharge in a controlled manner, such as the plasma discharge by the arc channel, the dielectric recovery process as well as residual plasma in the post arc period are of great importance to ensure the high repetition rate. The aforementioned mechanisms are established through optimization of the circuit element parameters such as the electrode geometry, the gap distance, the gas pressure, the gas type as well as the applied voltage and current ratings.
Keywords :
arcs (electric); electrodes; optimisation; plasma switches; pulsed power switches; spark gaps; sparks; arc channel; circuit element parameters; dielectric recovery process; electrical discharge; electrode geometry; gap distance; gas pressure; high power pulser system; microplasma discharge; optimization; residual plasma; short electric pulses; spark gap discharge; switch pulser; switching operation; Character generation; Circuits; Dielectrics; Electrical equipment industry; Electrodes; Plasma applications; Plasma properties; Pulse generation; Sparks; Switches;
Conference_Titel :
Pulsed Power Conference, 2009. PPC '09. IEEE
Conference_Location :
Washington, DC
Print_ISBN :
978-1-4244-4064-1
Electronic_ISBN :
978-1-4244-4065-8
DOI :
10.1109/PPC.2009.5386426