DocumentCode
3210186
Title
Pressure limitation of electron density measurement using a wave-cutoff method in weakly ionized plasmas
Author
Na, B.K. ; Lee, Y.S. ; Jun, H.S. ; Chang, H.Y.
Author_Institution
Korea Adv. Inst. of Sci. & Technol., Daejeon, South Korea
fYear
2009
fDate
1-5 June 2009
Firstpage
1
Lastpage
1
Abstract
Summary form only given: Wave-cutoff method using microwave provides capabilities for diagnostics of various processing plasmas, and can give the precise absolute electron densities. In this study, pressure limitation of electron density measurement using a wave- cutoff method is presented. As gas pressure increases, the wave-cutoff signal disappears. The disappearance of signal happens when the electron-neutral collision frequency is over the plasma frequency. At that time, the electron motion cannot catch up to the movement of the electromagnetic wave, and the electromagnetic waves begin to penetrate into plasma. In result, the wave-cutoff signal disappears. In this work, the pressure limitation of wave-cutoff method is shown by using an impedance analysis of the probe system, and using commercial microwave simulator, CST Micro-Wave Studio.
Keywords
ionisation; plasma density; plasma diagnostics; plasma electromagnetic wave propagation; CST Micro-Wave Studio; commercial microwave simulator; electromagnetic wave; electron density measurement; electron motion; electron-neutral collision frequency; gas pressure; impedance analysis; plasma diagnostics; plasma frequency; wave-cutoff method; weakly ionized plasmas; Density measurement; Electromagnetic scattering; Electrons; Frequency; Microwave theory and techniques; Plasma density; Plasma diagnostics; Plasma materials processing; Plasma measurements; Plasma waves;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science - Abstracts, 2009. ICOPS 2009. IEEE International Conference on
Conference_Location
San Diego, CA
ISSN
0730-9244
Print_ISBN
978-1-4244-2617-1
Type
conf
DOI
10.1109/PLASMA.2009.5227252
Filename
5227252
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