DocumentCode :
3210245
Title :
STARC´s Semiconductor Design Technology Research Activities and the HiSIM2 Advanced MOSFET Model Project
Author :
Furui, Y. ; Miura-Mattausch, M. ; Sadachika, N. ; Miyake, M. ; Ezaki, T. ; mattausch, H.J. ; Ohguro, T. ; Iizuka, T. ; Inagaki, R. ; Fudanuki, N.
Author_Institution :
Hiroshima Univ., Hiroshima
fYear :
2007
fDate :
21-23 June 2007
Firstpage :
41
Lastpage :
46
Abstract :
STARC (Semiconductor Technology Academic Research Center) is a research consortium co-founded by major Japanese semiconductor companies, whose mission is to contribute to the growth of the Japanese semiconductor industry by developing leading-edge SoC design technologies. One of the achievements enabled by the academia collaboration is HiSIM (Hiroshima University STARC IGFET Model) an advanced MOSFET Model. The HiSIM2 version includes required features in modeling for the 45 nm technology node and beyond such as the STI effect. A major development is an improved model consistency, which enables even modeling of the technology variation accurately. HiSIM2 realizes both accurate and fast circuit simulation.
Keywords :
MOSFET; circuit simulation; integrated circuit design; integrated circuit manufacture; nanoelectronics; research and development; system-on-chip; HiSIM2 advanced MOSFET model project; Japanese semiconductor industry; STARC; Semiconductor Technology Academic Research Center; SoC design; circuit simulation; semiconductor design technology; size 45 nm; Circuit simulation; Collaboration; Companies; Consumer electronics; Electronics industry; Lead compounds; MOSFET circuits; Radio frequency; Silicon; Testing; Analog & RF application; Calculation speed; MOSFET model; STARC Consortium; Surface potential;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Mixed Design of Integrated Circuits and Systems, 2007. MIXDES '07. 14th International Conference on
Conference_Location :
Ciechocinek
Print_ISBN :
83-922632-9-4
Electronic_ISBN :
83-922632-9-4
Type :
conf
DOI :
10.1109/MIXDES.2007.4286118
Filename :
4286118
Link To Document :
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