DocumentCode
3214549
Title
Measurements of OH radicals in low temperature atmospheric plasmas using pulsed- and cw-CRDS techniques
Author
Wang, C. ; Srivastava, N.
Author_Institution
Dept. of Phys. & Astron., Mississippi State Univ., Starkville, MS, USA
fYear
2009
fDate
1-5 June 2009
Firstpage
1
Lastpage
1
Abstract
Summary form only given. OH radicals have electronic transitions in the UV and overtone spectra in the NIR. Absolute number density of OH radicals can be quantified by using high sensitivity pulsed-cavity ringdown spectroscopy (CRDS) and diode laser continuous wave (cw)-CRDS techniques. However, the applicability of these two sets of CRDS techniques to different plasma sources (including discharges) is plasma-type-dependent and has not been fully investigated. We have employed the pulsed- and cw-CRDS techniques to quantify OH radicals created in an atmospheric microwave induced plasma (MIP), an MlP-jet, and an AC discharge. We present the results and discuss for the first time on the topic of the applicability of CRDS to OH measurements in different plasmas.
Keywords
free radicals; high-frequency discharges; plasma chemistry; plasma diagnostics; plasma jets; plasma sources; AC discharge; MlP-jet; OH radical measurement; atmospheric microwave induced plasma; cw-CRDS method; diode laser continuous wave CRDS; electronic transitions; low temperature atmospheric plasma; plasma sources; pulsed-cavity ringdown spectroscopy; Atmospheric measurements; Atmospheric waves; Fault location; Plasma density; Plasma measurements; Plasma sources; Plasma temperature; Plasma waves; Pulse measurements; Temperature sensors;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science - Abstracts, 2009. ICOPS 2009. IEEE International Conference on
Conference_Location
San Diego, CA
ISSN
0730-9244
Print_ISBN
978-1-4244-2617-1
Type
conf
DOI
10.1109/PLASMA.2009.5227463
Filename
5227463
Link To Document