DocumentCode
3214945
Title
Optimization and fabrication of the photonic crystals for large absolute band gaps
Author
Jia, Wei ; Deng, Jun ; Danner, Aaron ; Li, Xiangyin
Author_Institution
Sch. of Sci., Nanjing Univ. of Sci. & Technol., Nanjing, China
Volume
4
fYear
2011
fDate
29-31 July 2011
Abstract
In the paper, Optimization algorithm is used to design two-dimensional photonic crystals for large absolute band gaps. By optimizing the location and radius of rods in the unit cell, we present tree designs considering different shape rods. The genetic algorithm finally yielded a photonic crystal with an absolute common band gap of 0.0796(2πc/a) at the mid-frequency of 0.3712(2πc/a). The result have been fabricated using e-beam lithography (EBL) and inductively coupled plasma (ICP). We can find a large absolute band gap can be obtained.
Keywords
electron beam lithography; genetic algorithms; optical design techniques; optical fabrication; photonic band gap; photonic crystals; absolute band gaps; e-beam lithography; genetic algorithm; inductively coupled plasma; optimization; rods shape; two-dimensional photonic crystals; Photonics; fabrication; photonic band-gap under light line; two-dimensional photonic crystals;
fLanguage
English
Publisher
ieee
Conference_Titel
Electronics and Optoelectronics (ICEOE), 2011 International Conference on
Conference_Location
Dalian
Print_ISBN
978-1-61284-275-2
Type
conf
DOI
10.1109/ICEOE.2011.6013449
Filename
6013449
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