• DocumentCode
    3214945
  • Title

    Optimization and fabrication of the photonic crystals for large absolute band gaps

  • Author

    Jia, Wei ; Deng, Jun ; Danner, Aaron ; Li, Xiangyin

  • Author_Institution
    Sch. of Sci., Nanjing Univ. of Sci. & Technol., Nanjing, China
  • Volume
    4
  • fYear
    2011
  • fDate
    29-31 July 2011
  • Abstract
    In the paper, Optimization algorithm is used to design two-dimensional photonic crystals for large absolute band gaps. By optimizing the location and radius of rods in the unit cell, we present tree designs considering different shape rods. The genetic algorithm finally yielded a photonic crystal with an absolute common band gap of 0.0796(2πc/a) at the mid-frequency of 0.3712(2πc/a). The result have been fabricated using e-beam lithography (EBL) and inductively coupled plasma (ICP). We can find a large absolute band gap can be obtained.
  • Keywords
    electron beam lithography; genetic algorithms; optical design techniques; optical fabrication; photonic band gap; photonic crystals; absolute band gaps; e-beam lithography; genetic algorithm; inductively coupled plasma; optimization; rods shape; two-dimensional photonic crystals; Photonics; fabrication; photonic band-gap under light line; two-dimensional photonic crystals;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electronics and Optoelectronics (ICEOE), 2011 International Conference on
  • Conference_Location
    Dalian
  • Print_ISBN
    978-1-61284-275-2
  • Type

    conf

  • DOI
    10.1109/ICEOE.2011.6013449
  • Filename
    6013449