Title :
The optical spectra analysis of free oxygenic radicals in atmospheric microwave plasmas
Author :
Wang, S.M. ; Zhang, G.X. ; Zhang, Q. ; Wang, X.X.
Author_Institution :
Dept. of Electr. Eng. & Appl. Electron. Technol., Tsinghua Univ., Beijing, China
Abstract :
Summary form only given. This paper analyzes the emission spectra of atmospheric microwave Ar-air plasma and He-air plasma at the range of 200 to 1000 nm; diagnoses the free oxygenic radicals of them. Results reveal that, free oxygenic radicals occupy large proportion of all elements in the spectra of Ar-air and He-air plasmas. OH free radicals are strong near the 309-314 nm band compared with He atomic spectra lines whose comparative intensity very low in He-air plasma. In opposition, NO free radicals and other nitrogen oxides are more than OH radicals in Ar-air plasma. The intensity of free oxygenic radicals in He-air plasma is obvious weaker than in Ar-air plasma, and it changes comply with input energy and gas flow rate.
Keywords :
air; argon; free radicals; helium; high-frequency discharges; plasma chemistry; plasma diagnostics; plasma flow; Ar-O2; He-O2; atmospheric microwave plasmas; free oxygenic radicals; gas flow rate; optical spectra analysis; wavelength 200 nm to 1000 nm; Atmospheric-pressure plasmas; Atomic measurements; Discharges; Helium; Laboratories; Microwave technology; Nitrogen; Plasma diagnostics; Plasma waves; Stimulated emission;
Conference_Titel :
Plasma Science - Abstracts, 2009. ICOPS 2009. IEEE International Conference on
Conference_Location :
San Diego, CA
Print_ISBN :
978-1-4244-2617-1
DOI :
10.1109/PLASMA.2009.5227540
