DocumentCode
3218525
Title
Study on photoemission mechanism for negative electron affinity GaN vacuum electron source
Author
Qiao, J.L. ; Chang, B.K. ; Qian, Y.S. ; Wang, X.H. ; Li, Bing ; Fu, X.Q.
Author_Institution
Sch. of Electron. Eng. & Optoelectron. Tech., Nanjing Univ. of Sci. & Technol., Nanjing, China
fYear
2010
fDate
14-16 Oct. 2010
Firstpage
309
Lastpage
310
Abstract
In this paper, the "three-step model" of photoemission mechanism for gallium nitride (GaN) photocathode is discussed. The first step is the absorption of incidence light. The incidence photon energy is absorbed by the electrons in the valence band, and this establishes the foundation that the electrons in the valence band are stimulated to the conduction band. The second step is the transportation of photoelectron, the excitated electrons in the conduction band will move from bulk to surface by diffusing or drifting.The third step of cathode photoemission is that the photoelectron passes through the surface potential.
Keywords
III-V semiconductors; conduction bands; diffusion; gallium compounds; photoelectron spectra; photoemission; surface potential; wide band gap semiconductors; GaN; conduction band; diffusion; excitated electrons; incidence light absorption; negative electron affinity; photoelectron transportation; photoemission; photon energy; surface potential; three-step model; vacuum electron source; valence band; Gallium nitride;
fLanguage
English
Publisher
ieee
Conference_Titel
Vacuum Electron Sources Conference and Nanocarbon (IVESC), 2010 8th International
Conference_Location
Nanjing
Print_ISBN
978-1-4244-6645-0
Type
conf
DOI
10.1109/IVESC.2010.5644315
Filename
5644315
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