• DocumentCode
    3218525
  • Title

    Study on photoemission mechanism for negative electron affinity GaN vacuum electron source

  • Author

    Qiao, J.L. ; Chang, B.K. ; Qian, Y.S. ; Wang, X.H. ; Li, Bing ; Fu, X.Q.

  • Author_Institution
    Sch. of Electron. Eng. & Optoelectron. Tech., Nanjing Univ. of Sci. & Technol., Nanjing, China
  • fYear
    2010
  • fDate
    14-16 Oct. 2010
  • Firstpage
    309
  • Lastpage
    310
  • Abstract
    In this paper, the "three-step model" of photoemission mechanism for gallium nitride (GaN) photocathode is discussed. The first step is the absorption of incidence light. The incidence photon energy is absorbed by the electrons in the valence band, and this establishes the foundation that the electrons in the valence band are stimulated to the conduction band. The second step is the transportation of photoelectron, the excitated electrons in the conduction band will move from bulk to surface by diffusing or drifting.The third step of cathode photoemission is that the photoelectron passes through the surface potential.
  • Keywords
    III-V semiconductors; conduction bands; diffusion; gallium compounds; photoelectron spectra; photoemission; surface potential; wide band gap semiconductors; GaN; conduction band; diffusion; excitated electrons; incidence light absorption; negative electron affinity; photoelectron transportation; photoemission; photon energy; surface potential; three-step model; vacuum electron source; valence band; Gallium nitride;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Vacuum Electron Sources Conference and Nanocarbon (IVESC), 2010 8th International
  • Conference_Location
    Nanjing
  • Print_ISBN
    978-1-4244-6645-0
  • Type

    conf

  • DOI
    10.1109/IVESC.2010.5644315
  • Filename
    5644315