DocumentCode :
3219648
Title :
A 65nm level-1 cache for mobile applications
Author :
Mohammad, Baker ; Lin, Ken ; Bassett, Paul ; Aziz, Adnan
fYear :
2008
fDate :
14-17 Dec. 2008
Firstpage :
5
Lastpage :
10
Abstract :
We describe L1 cache designed for QUALCOMM娫s latest-generation digital signal processor (DSP) core. The cache is 32KB with variable associativity (4 to 16 ways) and is pseudo-dual-ported. Dual access is achieved by banking the cache in a way that minimizes bank conflict to less than 1%. The cache operates at 600 MHZ under worst-case PVT conditions and dissipates 100.8 pJoule per access at 1.2V. A low-leakage multi-threshold-voltage (MTV) 65nm foundry process technology is used for fabrication.. The cache supports simultaneous dual double-word access , and four-double-word evict and fill operations. The memory system includes a tag array and data array: both are designed using QUALCOMM娫s defined single-ported 6T SRAM cell, with an area of 0.54 mm2 and leakage per cell of less than 10 pA. Three threshold voltages are used with foot and head switches to trade off leakage, active power, and performance. The design of the tag and data array uses novel circuit approaches to enable high coverage on testability through data bypassing with minimum impact to speed. It also employs self-timed circuit with process-dependent sense-amp tracking for high speed and low power.
Keywords :
SRAM chips; cache storage; digital signal processing chips; QUALCOMM; data array; digital signal processor core; dual access; dual double-word access; fill operations; foundry process technology; four-double-word evict; frequency 600 MHz; level-1 cache; memory system; mobile applications; selftimed circuit; single-ported 6T SRAM cell; size 65 nm; storage capacity 32 Kbit; tag array; voltage 1.2 V; Banking; Circuit testing; Digital signal processing; Digital signal processors; Fabrication; Foot; Foundries; Random access memory; Signal design; Threshold voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microelectronics, 2008. ICM 2008. International Conference on
Conference_Location :
Sharjah
Print_ISBN :
978-1-4244-2369-9
Electronic_ISBN :
978-1-4244-2370-5
Type :
conf
DOI :
10.1109/ICM.2008.5393826
Filename :
5393826
Link To Document :
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