DocumentCode
3220549
Title
PREVAIL-a high throughput e-beam projection approach for next generation lithography
Author
Pfeiffer, H.C.
Author_Institution
Semicond. Res. & Dev. Center, IBM Electron., Hopewell Junction, NY, USA
fYear
1999
fDate
6-8 July 1999
Firstpage
28
Lastpage
29
Abstract
PREVAIL - Projection Reduction Exposure with Variable Axis Immersion Lenses represents the high throughput e-beam projection approach to NGL which 1BM is pursuing with Nikon as alliance partner. This talk will discuss the challenges and accomplishments of the PREVAIL project. It will focus on the results obtained with the Proof of Concept (POC) system. This system was developed to demonstrate key technical building blocks required for high throughput, high resolution e-beam step and scan projection lithography.
Keywords
electron beam lithography; PREVAIL; Projection Reduction Exposure with Variable Axis Immersion Lenses; high throughput e-beam projection approach; next generation lithography; Electron optics; Image quality; Image resolution; Lenses; Lithography; Microelectronics; Optical distortion; Research and development; Resists; Throughput;
fLanguage
English
Publisher
ieee
Conference_Titel
Microprocesses and Nanotechnology Conference, 1999. Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International
Conference_Location
Yokohama, Japan
Print_ISBN
4-930813-97-2
Type
conf
DOI
10.1109/IMNC.1999.797460
Filename
797460
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