Title :
PREVAIL-a high throughput e-beam projection approach for next generation lithography
Author_Institution :
Semicond. Res. & Dev. Center, IBM Electron., Hopewell Junction, NY, USA
Abstract :
PREVAIL - Projection Reduction Exposure with Variable Axis Immersion Lenses represents the high throughput e-beam projection approach to NGL which 1BM is pursuing with Nikon as alliance partner. This talk will discuss the challenges and accomplishments of the PREVAIL project. It will focus on the results obtained with the Proof of Concept (POC) system. This system was developed to demonstrate key technical building blocks required for high throughput, high resolution e-beam step and scan projection lithography.
Keywords :
electron beam lithography; PREVAIL; Projection Reduction Exposure with Variable Axis Immersion Lenses; high throughput e-beam projection approach; next generation lithography; Electron optics; Image quality; Image resolution; Lenses; Lithography; Microelectronics; Optical distortion; Research and development; Resists; Throughput;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 1999. Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International
Conference_Location :
Yokohama, Japan
Print_ISBN :
4-930813-97-2
DOI :
10.1109/IMNC.1999.797460
