• DocumentCode
    3220698
  • Title

    Collisional ion energy distribution (IED) model for single frequency capacitive discharges

  • Author

    Ying Wang ; Verboncoeur, J.P. ; Lieberman, M.A.

  • Author_Institution
    UC Berkeley, Berkeley, CA, USA
  • fYear
    2009
  • fDate
    1-5 June 2009
  • Firstpage
    1
  • Lastpage
    1
  • Abstract
    Summary form only given. The distributions of particles on substrate surfaces are very important for materials processing, and it is valuable to develop fast computation models to predict and control them. A model is developed to determine the ion energy distribution (IED) from the tool measurements in a single-frequency driven capacitive discharge in a collisional sheath regime. The sheath width and sheath voltage are estimated from the external control parameters by an analytical model (M.A. Lieberman and A.J. Lichtenberg, 2005). The results are verified very well by 1D particle-in-cell (PIC) simulations. The ion mean free path is considered to be a known function of energy, and the sheath voltage and sheath width are independent of time and position in preliminary work. It is found that with various dependences of the ion mean free path on energy, the IEDs exhibit markedly different profiles. To verify our collisional sheath model with PIC simulations and experiments, it is necessary to consider rf-driven collisional sheath dynamics.
  • Keywords
    high-frequency discharges; plasma collision processes; plasma sheaths; plasma simulation; 1D particle-in-cell simulations; IED model; PIC simulations; collisional ion energy distribution; collisional sheath model; ion mean free path; rf-driven collisional sheath dynamics; sheath voltage; sheath width; single frequency capacitive discharge; Analytical models; Computational modeling; Distributed computing; Energy measurement; Frequency; Materials processing; Plasma materials processing; Predictive models; Surface discharges; Voltage control;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science - Abstracts, 2009. ICOPS 2009. IEEE International Conference on
  • Conference_Location
    San Diego, CA
  • ISSN
    0730-9244
  • Print_ISBN
    978-1-4244-2617-1
  • Type

    conf

  • DOI
    10.1109/PLASMA.2009.5227743
  • Filename
    5227743