Title :
Chemically amplified electron beam positive resist with acetal protecting group
Author :
Saito, Satoshi ; Kihara, Naoko ; Ushirogouchi, Tohru ; Nakasugi, Tetsuro
Author_Institution :
Mater. & Devices Res. Lab., Toshiba Corp., Kawasaki, Japan
Abstract :
In this paper, we discuss about the chemically amplified EB positive resist based on acetal-protected Poly(hydroxystyrene) (PHS) and investigate the influence of the photo-acid generator to resist performance.
Keywords :
electron resists; polymer films; PHS; acetal protecting group; chemically amplified electron beam positive resist; photo-acid generator; poly(hydroxystyrene); Chemicals; Electron beams; Fabrication; Laboratories; Polymers; Protection; Random access memory; Resists; Ultra large scale integration; Writing;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 1999. Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International
Conference_Location :
Yokohama, Japan
Print_ISBN :
4-930813-97-2
DOI :
10.1109/IMNC.1999.797487
