Title :
X-ray and EUV liquid-jet-target laser-plasma sources based on solutions and cryogenic liquids
Author :
Hansson, B.A.M. ; Rymell, L. ; Berglund, M. ; Hertz, H.M.
Author_Institution :
Dept. of Biomed. & X-ray Phys., R. Inst. of Technol., Stockholm, Sweden
Abstract :
Here we report on new experiments, extending the laser produced plasma source´s applicability for lithography by producing liquid-jet targets of substances that are gases or solids at normal pressure and temperature. This development is important since new wavelength ranges become accessible. Furthermore, the possibility to chose high-Z target material should lead to higher conversion efficiencies.
Keywords :
X-ray lithography; X-ray production; cryogenics; jets; light sources; plasma applications; plasma production by laser; ultraviolet lithography; EUV liquid-jet-target laser-plasma sources; X-ray liquid-jet-target laser-plasma sources; conversion efficiencies; cryogenic liquids; high-Z target material; laser produced plasma source; liquid-jet targets; lithography; wavelength ranges; Atmospheric-pressure plasmas; Gas lasers; Lithography; Plasma materials processing; Plasma sources; Plasma temperature; Plasma waves; Plasma x-ray sources; Solid lasers; X-ray lasers;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 1999. Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International
Conference_Location :
Yokohama, Japan
Print_ISBN :
4-930813-97-2
DOI :
10.1109/IMNC.1999.797496
