Title :
New writing routines for SEM based e-beam lithography
Author :
Dubonos, S.V. ; Raith, H.F. ; Svintsov, A.A. ; Zaitsev, S.I.
Author_Institution :
Inst. of Microelectron. Technol. & High Purity Mater., Acad. of Sci., Chernogolovka, Russia
Abstract :
The challenge of SEM based e-beam lithography is not just in copying writing routines used in dedicated e-beam lithography machines, but also in exploring new fields of application. A new writing routine for TIFF images with their 256 grey levels allows to produce 3-dimensional structures in resist, which can be used e.g. for the direct writing of computer-generated phase holograms. Another new writing routine allows a full compensation of limiting SEM performance in respect to its dynamic behaviour and field distortion. By using this method, the main restrictions of SEM based e-beam lithography can be overcome.
Keywords :
computer-generated holography; electron beam lithography; scanning electron microscopy; SEM; TIFF image; computer-generated phase hologram; dynamic compensation; e-beam lithography; field distortion; resist; three-dimensional structure; writing routine; Application software; Electrostatic measurements; Error correction; Lead; Lithography; Microelectronics; Pixel; Resists; Writing;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 1999. Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International
Conference_Location :
Yokohama, Japan
Print_ISBN :
4-930813-97-2
DOI :
10.1109/IMNC.1999.797501
