Title :
Development of Functional Ceramic Films for Nano and Microsystems Technology
Author :
Schonecker ; Gebhardt, S. ; Schlenkrich, F. ; Endler, I. ; Mayer-Uhma, T. ; Uhlig, S.
Author_Institution :
Fraunhofer IKTS, Dresden
Abstract :
Ceramic films are considered as key functional material in nano and microsystems technology. IKTS has built the experimental basis for the development of functional films using screen printing, CSD, CVD, PVD, RIE and CMP, covering a wide range of chemical composition, film thickness and processing windows. Substrates of interest are those, forming the integration basis of microsystems, like Silicon (Si) wafers and glass ceramics (LTCC). The present paper is going to discuss the availability of various ceramics films for the design, development and fabrication of advanced nano and microsystems
Keywords :
elemental semiconductors; glass ceramics; micromechanical devices; silicon; IKTS; LTCC; Si; chemical composition; film thickness; functional ceramic films; glass ceramics; microsystems technology; nanosystems technology; screen printing; semiconductor wafers; Atherosclerosis; Ceramics; Chemical processes; Chemical technology; Chemical vapor deposition; Glass; Printing; Silicon; Substrates; Windows;
Conference_Titel :
Electronics Systemintegration Technology Conference, 2006. 1st
Conference_Location :
Dresden
Print_ISBN :
1-4244-0552-1
Electronic_ISBN :
1-4244-0553-x
DOI :
10.1109/ESTC.2006.280088
