Title :
Self limiting etching of piezoelectric crystals
Author :
Lakin, K.M. ; Kline, G.R. ; McCarron, K.T.
Author_Institution :
TFR Technol. Inc., Redmond, OR, USA
fDate :
31 May-2 Jun 1995
Abstract :
Piezoelectric plates have been thinned by various techniques including chemical and plasma etching, This paper reports on a novel method of plasma thinning piezoelectric plates in order to make high frequency resonators in inverted mesa or other configurations. The method involves using plasma excitation at the frequency where resonance is desired. Theoretical and experimental results are presented
Keywords :
crystal resonators; quartz; sputter etching; high frequency resonators; inverted mesa configuration; piezoelectric crystals; piezoelectric plates; plasma etching; plasma excitation; self limiting etching; Etching; Impedance; Plasma applications; Plasma chemistry; Plasma devices; Plasma materials processing; Plasma sources; Radio frequency; Resonant frequency; Voltage;
Conference_Titel :
Frequency Control Symposium, 1995. 49th., Proceedings of the 1995 IEEE International
Conference_Location :
San Francisco, CA
Print_ISBN :
0-7803-2500-1
DOI :
10.1109/FREQ.1995.484091
