Title :
Detection of metastable Cl/sup +/ ions in time-modulated ICP by time resolved LIF
Author :
Kumagai, S. ; Sasaki, M. ; Koyanagi, M. ; Hane, K.
Author_Institution :
Dept. of Mechatronics & Precision Eng., Tohoku Univ., Sendai, Japan
Abstract :
Pulse time-modulated plasma etching is used to achieve high anisotropy, high etch rate, high selectivity and low charging damage by making use of the reactive plasma species composition changes. The authors have measured, for the first time, the metastable chlorine ions Cl/sup +*/ in time-modulated inductively coupled plasma by time resolved laser induced fluorescence spectroscopy.
Keywords :
chlorine; fluorescence; metastable states; plasma chemistry; plasma diagnostics; pulse time modulation; sputter etching; time resolved spectroscopy; Cl; charging damage; etch anisotropy; etch rate; etch selectivity; metastable Cl/sup +*/ ions; plasma diagnostics; pulse time-modulated inductively coupled plasma etching; reactive plasma species composition; time resolved laser induced fluorescence spectroscopy; Delay effects; Density measurement; Etching; Frequency modulation; Laser transitions; Metastasis; Plasma applications; Plasma measurements; Plasma temperature; Time measurement;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 1999. Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International
Conference_Location :
Yokohama, Japan
Print_ISBN :
4-930813-97-2
DOI :
10.1109/IMNC.1999.797521
